Vacuum El System manufactures vacuum coating systems modified to specific products or coatings. Our systems are customized with deposition sources according to the customers requirements.

By applying a high voltage between the target-cathode and substrate-anod, the material is removed as atoms or molecules from the target and then deposited as atomic layer on the substrate. When the process passes in Argon medium, the deposited layer has identical composition with the target. When the working gass is chemically reactive such as Oxigen or Nitrogen, the deposited layer is chemically different from the target. The reactive sputtering is used to produce non-conductive film.